Near-field etching

Near-field etching achieve angstrom-scale flat surfaces.  Near-field etching is a noncontact method and therefore does not cause damage owing to mechanical polishing, and hence, this technique should help to improve the electrical, optical, and/or electro-optical performance of devices in a variety of applications.

Publications on the near-field etching

  1. F. Brandenburg, R. Nagumo, K. Saichi, K. Tahara, T. Iwasaki, M. Hatano, F. Jelezko, R. Igarashi, and T. Yatsui, “Improving the electron spin properties of nitrogen-vacancy centres in nanodiamonds by near-field etching,” Scientific Reports, Vol. 8, October 2018, 15847 (8 pages)
  2. T. Yatsui, H. Saito, K. Nishioka, B. Leuschel, O. Soppera, and K. Nobusada, “Effects of a power and photon energy of incident light on near-field etching properties,” Appl. Phys. A, Volume 123, Issue 12, December 2017, 751
  3. Takashi Yatsui, Hiroshi Saito, and Katsuyuki Nobusada, “Angstrom-scale flatness using selective nano-scale etching,” Beilstein Journal of Nanotechnology, Vol. 8, October 18, 2017, pp.2181–2185. doi:10.3762/bjnano.8.217.
  4. T. Yatsui, M. Yamaguchi and K. Nobusada, “Nano-scale chemical reactions based on non-uniform optical near-fields and their applications,” Progress in Quantum ElectronicsSeptember 2017, Vol. 55, pp. 166-194, doi: 10.1016/j.pquantelec.2017.06.001. (review article).
  5. F. J. Brandenburg, T. Okamoto, H. Saito, O. Soppera, and T. Yatsui, “Surface improvement of organic photo-resists through a near-field-dependent etching method,” Beilstein Journal of Nanotechnology, April 2017, Vol. 8, pp.784–788
  6. T. Yatsui, T. Tsuboi, M. Yamaguchi, K. Nobusada, S. Tojo, F. Stehlin, O. Soppera, and D. Bloch, “Optically controlled magnetic-field etching on the nano-scale,” Light: Science & Applications, Volume 5, March 2016; e16054 (7 pages); doi: 10.1038/lsa.2016.54
  7. R. Nagumo, F. Brandenburg, A. Ermakova, F. Jelezko, and T. Yatsui, “Spectral control of nanodiamond using dressed photon-phonon etching,” Applied Physics A, Volume 121, Issue 4, December 2015, pp.1335-1339, DOI: 10.1007/s00339-015-9400-0 [invited paper]
  8. Takashi Yatsui, Wataru Nomura, and Motoichi Ohtsu, “Realization of Ultraflat Plastic Film using Dressed-Photon–Phonon-Assisted Selective Etching of Nanoscale Structures,” Advances in Optical Technologies, February 2015, Article ID 701802 (5 pages)
  9. T. Yatsui, Daisuke Takeuchi, Satoshi Koizumi, Kazuki Sato, Kohei Tsuzuki, Takayuki Iwasaki, Mutsuko Hatano, Toshiharu Makino Masahiko Ogura, Hiromitsu Kato, Hideyo Okushi, and Satoshi Yamasaki, “Polarization-controlled dressed-photon–phonon etching of patterned diamond structures,”  physica status solidi (a), Vol. 211, No. 10, October 2014, pp. 2339–2342, DOI: 10.1002/pssa.201431161
  10. T. Yatsui, W. Nomura, F. Stehlin, O. Soppera, M. Naruse, and M. Ohtsu, “Challenge in realizing ultraflat material surfaces,” Beilstein Journal of Nanotechnology, December 2013, Volume 4, pp.875–885
  11. M. Naruse, T. Yatsui, W. Nomura, T. Kawazoe, M. Aida, and M. Ohtsu, “Unveiling the mechanisms of dressed-photon–phonon etching based on hierarchical surface roughness measure,” Appl. Phys. Lett., Vol. 102, No. 7, February 2013, 071603 (5 pages).
  12. T. Yatsui, W. Nomura, M. Naruse, and M. Ohtsu, “Realization of an atomically flat surface of diamond using dressed-photon phonon etching,” J. Phys. D, Volume 45, Number 47, November 2012, 475302 (4 pages), DOI:10.1088/0022-3727/45/47/475302.
  13. T. Yatsui, K. Hirata, Y. Tabata, Y. Miyake, Y. Akita, M. Yoshimoto, W. Nomura, T. Kawazoe, M. Naruse, and M. Ohtsu, “Self-organized near-field etching of the sidewalls of glass corrugations,” Appl. Phys. B- Lasers and Optics, Volume 103, Number 3, June 2011, pp.527-530.
  14. T. Yatsui, K. Hirata, Y. Tabata, W. Nomura, T. Kawazoe, M. Naruse, and M. Ohtsu, “In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching,” Nanotechnology, Vol. 21, No. 35, August 2010, 355303 (5 pages)
  15. N. Tate, H. Sugiyama, M. Naruse, W. Nomura, T. Yatsui, T. Kawazoe, and M. Ohtsu, “Quadrupole-Dipole Transform based on Optical Near-Field Interactions in Engineered Nanostructures,” Opt. Express, Vol. 17, Issue 13, June 2009, pp.11113-11121
  16. Makoto Naruse, Takashi Yatsui, Wataru Nomura, Kazuya Hirata, Yoshinori Tabata, and Motoichi Ohtsu, “Analysis of surface roughness of optical elements planarized by nonadiabatic optical near-field etching,” J. Appl. Phys. Vol. 105, No. 6, Mar. 2009, 063516 (4 pages)
  17. T. Yatsui, K. Hirata, W. Nomura, Y. Tabata, and M. Ohtsu, “Realization of an ultra-flat silica surface with angstrom-scale average roughness using nonadiabatic optical near-field etching,” Appl. Phys. B- Lasers and Optics, Vol. 93, No. 1, Oct. 2008, pp.55-57

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